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hot_img UBS: It will be difficult for China to develop EUV lithography equipment comparable to ASML's top products within the next ten years; DUV mass production may take two to five years

According to Bloomberg, UBS analysts expect that China's semiconductor manufacturing capabilities may struggle to make sufficient progress in the next decade to develop solutions that can truly replace ASML's advanced EUV lithography technology. UBS analysts wrote in their report, "The stage they are currently at seems comparable to ASML's in 2004." Based on patent application activities, especially in the fields of light sources and laser subsystems, China's current technological maturity is roughly equivalent to ASML's level 15 years before it began mass production of EUV equipment.UBS also expects that China is likely to achieve large-scale production capabilities for immersion DUV lithography machines within the next two to five years. While immersion DUV is not as advanced as EUV, it remains an indispensable tool for chip manufacturing. ASML's immersion DUV machines are priced at nearly $90 million, while EUV equipment costs over $200 million each. China is one of ASML's largest markets, but due to export restrictions, ASML is prohibited from selling EUV equipment to China. UBS pointed out that considering the yield and capacity gaps, as well as regulatory restrictions, Chinese lithography equipment is unlikely to be applied overseas. An ASML spokesperson did not respond to requests for comment. This report is based on UBS analysts' predictive views, and actual progress will depend on industry dynamics.

Vitalik releases research on "local mixing" cryptography: exploring next-generation obfuscation techniques, which may become a new foundational primitive in cryptography

Ethereum co-founder Vitalik Buterin published a new article titled "Obfuscation (Part 3): Local Mixing," which delves into a cryptographic obfuscation technique being explored—"Local Mixing." He claims it may become a new foundational cryptographic tool following elliptic curves, RSA, and lattice-based cryptography.Vitalik states that current mainstream obfuscation techniques mainly rely on complex mathematical assumptions, often resulting in extremely high computational overhead. In contrast, Local Mixing adopts a completely different approach, not relying on elliptic curves, large integer factorization, or lattice cryptography. Instead, it draws on experiences from symmetric cryptography and hash function design, continuously shuffling, reconstructing, and hiding circuit structures to eliminate information leakage while maintaining functionality.The Local Mixing technique primarily includes steps such as reversibility, hardening, mixing, splitting, crossing walk, and "gadgetization." By introducing random structures into the circuit, rearranging logic gates, and employing nonlinear hiding mechanisms, it makes it difficult for attackers to recover the original computational logic.Vitalik points out that this technology is still in its early stages, with security not yet validated over the long term and facing challenges such as random attacks and linear analysis. However, he believes that Local Mixing represents a completely new path for cryptographic exploration, aiming to construct more efficient indistinguishable obfuscation (iO) schemes.If breakthroughs in Local Mixing technology are achieved, it could lead to new quantum-resistant public key encryption schemes and promote the development of general obfuscation techniques. The field still requires years of cryptanalysis and optimization validation, but AI-assisted research may significantly accelerate this maturation process. Vitalik states that obfuscation technology is seen as the "final frontier" of cryptography because, theoretically, other cryptographic primitives can be constructed based on obfuscation and one-way functions. Local Mixing may not only reduce the costs of traditional obfuscation schemes but could also become an important direction for future cryptographic infrastructure.

hot_img Domestic immersion DUV lithography machines have started small batch production, with plans to deliver about 5 units this year

According to a report by The Information citing informed sources, a Shanghai state-owned company whose name has not been disclosed has begun producing domestically-made immersion DUV lithography machines, planning to manufacture about 5 units this year and increase to about 20 units by 2027. The first batch of equipment will be delivered to major foundries such as SMIC, Hua Hong Semiconductor, and ChangXin Technology, but the equipment still needs to undergo verification for accuracy, stability, and production line compatibility, a process that may take several months or even longer.Currently, most components of the equipment come from domestic sources, but some key parts still rely on Japan, and the performance and manufacturing quality lag behind ASML. In comparison, ASML is set to deliver about 131 immersion DUV lithography machines as early as 2025. Although domestic equipment has made the leap from prototype testing to small-scale production, there is still a significant gap before it can replace ASML on a large scale. Previously, Reuters reported that the U.S. is considering tightening restrictions on the export of lithography equipment to China and on maintenance services in China, and the delivery of domestic equipment coincides with this backdrop.

Cointelegraph talks to Gate Europe's CEO: sharing MiCA compliance layout and continuously deepening development in the European market

Gate Europe CEO Dr. Giovanni Cunti was invited to participate in a live interview on Cointelegraph X Space, where he shared insights on the regulatory trends of digital assets in Europe, the MiCA compliance framework, and Gate Europe's development strategy in Europe. Dr. Giovanni Cunti stated that the implementation of MiCA is an important step towards the unification of the European market, "Unified regulation brings broader market access, and market access will further drive institutional adoption." He believes that after the adjustments made under the MiCA framework, market participants will be able to operate in a clearer and more transparent regulatory environment, providing institutional investors with a higher degree of security and trust.During the live broadcast, Dr. Giovanni Cunti also introduced the latest strategic progress of Gate Europe in the European region. He emphasized that Gate Europe proactively began compliance alignment as early as the initial phase of the MiCA framework in 2021. Leveraging the dual licensing advantages of MiCA and Payment Institutions (PI), Gate Europe is steadily strengthening compliance, risk control, and operational governance while continuously expanding digital asset trading, wealth management, and localized services, committed to providing European users with safer, more transparent, and efficient digital asset services.As the global regulatory framework for digital assets continues to improve, compliance is becoming an important foundation for the long-term development of the industry. Currently, Gate has completed regulatory registrations, license applications, or obtained authorizations and approvals in multiple jurisdictions including Europe, the United States, Japan, Dubai, Australia, and the Bahamas, continuously advancing its global compliance strategy. In the future, Gate will adhere to the parallel development of compliance and innovation, continuously enhance its global service capabilities, promote the steady development of the digital asset industry, and provide global users with safer, more efficient, and trustworthy products and services.

BSC releases a report on quantum-resistant cryptography migration: transaction signatures have switched to ML-DSA-44, TPS testing has decreased by about 40%-50%

On May 14, BNB Chain released the "BSC Post-Quantum Cryptography Migration Report," stating that it has completed the migration testing for quantum-resistant cryptography for transaction signatures and the consensus layer, using the NIST standardized post-quantum signature algorithm ML-DSA-44 (Dilithium) and the pqSTARK aggregation scheme.The report shows that BSC has replaced transaction signatures from ECDSA to ML-DSA-44 and switched consensus voting aggregation from BLS12-381 to pqSTARK to address the potential threats posed by future quantum computing to the existing elliptic curve cryptography system. However, post-quantum signatures also significantly increase the on-chain data volume: the size of a single transaction has increased from about 110 bytes to approximately 2.5KB; the block size in a 2000 TPS scenario has increased from about 130KB to around 2MB; and the TPS in the testing environment has decreased by about 40%-50%.BSC stated that the current network bottleneck mainly comes from the larger transaction data propagation, rather than the consensus protocol itself. Meanwhile, the consensus layer aggregation still maintains high efficiency, with pqSTARK achieving a signature compression ratio of about 43:1, and the additional burden on validators remains within a controllable range. The report concludes that existing technology can achieve "quantum-resistant" deployment for blockchain, but future issues related to network bandwidth and data scalability still need to be addressed.
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